Researchers have developed a single-axis MEMS (Micro-Electro-Mechanical Systems) capacitive accelerometer, optimized to enhance noise stability. This advancement focuses on applying wet etching techniques in the device's fabrication, allowing for greater precision in defining micrometric structures and, consequently, a significant reduction in noise sources that affect acceleration measurement. The design incorporates a differential capacitive architecture that is intrinsically robust against temperature variations and other environmental disturbances, which is crucial for high-precision applications.

The fabrication process utilizes wet etching, a technique that offers greater selectivity and control over the geometry of structures compared to conventional dry etching methods. This translates into a reduction of residual stresses and surface defects, factors that directly contribute to the intrinsic noise of the sensor. The optimization of the geometric design of the electrodes and suspensions, along with improved etching uniformity, has enabled the achievement of superior sensitivity and noise stability compared to devices manufactured with standard processes.

Experimental results demonstrate that the optimized accelerometer exhibits improved noise stability, with a significantly reduced standard deviation of the output signal. This performance makes it suitable for applications requiring high-fidelity acceleration measurements, such as inertial navigation systems, structural monitoring, and vibration control in industrial and aerospace environments. The ability to reproducibly and cost-effectively manufacture these devices using MEMS processes opens new avenues for integrating high-precision sensors into a wide range of systems.